Invention Grant
- Patent Title: Fluorine-containing spiroacetal compound and method of producing the same
- Patent Title (中): 含氟螺旋缩醛化合物及其制造方法
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Application No.: US12089593Application Date: 2006-10-10
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Publication No.: US07919637B2Publication Date: 2011-04-05
- Inventor: Takayuki Ito , Toshimitsu Sakuma
- Applicant: Takayuki Ito , Toshimitsu Sakuma
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2005-296817 20051011
- International Application: PCT/JP2006/320516 WO 20061010
- International Announcement: WO2007/043672 WO 20070419
- Main IPC: C07D317/72
- IPC: C07D317/72

Abstract:
A fluorine-containing spiroacetal compound represented by the following formula (A): wherein X represents >C(CF3)(Y) or >C═CF2, in which Y represents —CF2OCOR1, —COOR2, —COF, or —CH2OR3, R1 represents an alkyl or cycloalkyl group having at least one fluorine atom, R2 represents a hydrogen atom, an alkali metal, an alkaline earth metal, an alkyl group, or a cycloalkyl group and R3 represents a hydrogen atom or an acyl group; wherein the alkyl or cycloalkyl group for R1 may have a substituent other than fluorine atom; the alkyl or cycloalkyl group for R2 may have a substituent; and the acyl group for R3 may have a substituent.
Public/Granted literature
- US20090149664A1 NOVEL FLUORINE-CONTAINING SPIROACETAL COMPOUND AND METHOD OF PRODUCING THE SAME Public/Granted day:2009-06-11
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