Invention Grant
- Patent Title: Method for fabricating plasma reactor parts
- Patent Title (中): 制造等离子体反应器部件的方法
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Application No.: US11766626Application Date: 2007-06-21
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Publication No.: US07919722B2Publication Date: 2011-04-05
- Inventor: Elmira Ryabova , Jennifer Sun , Jie Yuan
- Applicant: Elmira Ryabova , Jennifer Sun , Jie Yuan
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B23K10/00
- IPC: B23K10/00
Abstract:
A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part by heating the part at a predetermined heating rate, maintaining the part at a constant annealing temperature, and cooling the part at a predetermined cooling rate. At least one of the sintering and annealing atmospheres is an oxygen-containing atmosphere.
Public/Granted literature
- US20080099148A1 METHOD FOR FABRICATING PLASMA REACTOR PARTS Public/Granted day:2008-05-01
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