Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11791502Application Date: 2005-12-08
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Publication No.: US07919772B2Publication Date: 2011-04-05
- Inventor: Shinobu Furukawa , Ryota Imahayashi
- Applicant: Shinobu Furukawa , Ryota Imahayashi
- Applicant Address: JP
- Assignee: Semiconductor Energy laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP2004-361999 20041214
- International Application: PCT/JP2005/022989 WO 20051208
- International Announcement: WO2006/064859 WO 20060622
- Main IPC: H01L29/08
- IPC: H01L29/08

Abstract:
A nonvolatile memory has a problem in that applied voltage is high. This is because a carrier needs to be injected into a floating gate through an insulating film by a tunneling effect. In addition, there is concern about deterioration of the insulating film by performing such carrier injection. An object of the present invention is to provide a memory in which applied voltage is lowered and deterioration of an insulating film is prevented. One feature is to use a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound as a layer functioning as a floating gate of a memory. A specific example is an element having a transistor structure where a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound and which is sandwiched between insulating layers is used as a floating gate.
Public/Granted literature
- US20080042128A1 Semiconductor Device and Manufacturing Method Thereof Public/Granted day:2008-02-21
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