Invention Grant
- Patent Title: Magnetoresistive element and manufacturing method thereof
- Patent Title (中): 磁阻元件及其制造方法
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Application No.: US12108093Application Date: 2008-04-23
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Publication No.: US07919826B2Publication Date: 2011-04-05
- Inventor: Masayoshi Iwayama , Yoshiaki Asao , Takeshi Kajiyama , Keiji Hosotani
- Applicant: Masayoshi Iwayama , Yoshiaki Asao , Takeshi Kajiyama , Keiji Hosotani
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-114315 20070424; JP2008-106058 20080415
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A magnetoresistive element includes a first stacked structure formed by sequentially stacking a first fixed layer in which a magnetization direction is fixed and a first nonmagnetic layer, a second stacked structure formed on the first stacked structure by sequentially stacking a free layer in which a magnetization direction is changeable, a second nonmagnetic layer, and a second fixed layer in which a magnetization direction is fixed, and a circumferential wall formed in contact with a circumferential surface of the second stacked structure to surround the second stacked structure, and made of an insulator. A circumferential surface of the first stacked structure is substantially perpendicular. The second stacked structure has a tapered shape which narrows upward.
Public/Granted literature
- US20080265347A1 MAGNETORESISTIVE ELEMENT AND MANUFACTURING METHOD THEREOF Public/Granted day:2008-10-30
Information query
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