Invention Grant
- Patent Title: Nitride semiconductor device having oxygen-doped N-type gallium nitride freestanding single crystal substrate
- Patent Title (中): 具有氧掺杂N型氮化镓独立单晶衬底的氮化物半导体器件
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Application No.: US12652602Application Date: 2010-01-05
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Publication No.: US07919831B2Publication Date: 2011-04-05
- Inventor: Kensaku Motoki , Masaki Ueno
- Applicant: Kensaku Motoki , Masaki Ueno
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2001-113872 20010412
- Main IPC: H01L31/0304
- IPC: H01L31/0304

Abstract:
The present invention is a nitride semiconductor device including an n-type gallium nitride single crystal substrate, an epitaxially grown nitride film on the substrate, and electrodes deposited on a top and a bottom of the substrate. In order to produce the substrate, oxygen is doped into a gallium nitride crystal by preparing a C-plane gallium nitride seed crystal or a three-rotationally symmetric plane foreign material seed crystal, supplying material gases including gallium, nitrogen and oxygen to the C-plane gallium nitride seed crystal or the three-rotationally symmetric foreign seed crystal, growing a faceted C-plane gallium nitride bulk crystal having facets of non-C-planes on the seed crystal, maintaining the facets on the C-plane gallium nitride bulk crystal, and eliminating the seed crystal from the bulk crystal.
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