Invention Grant
US07920339B2 Method and apparatus providing singlet wafer lens system with field flattener
有权
提供具有场平压器的单晶圆片透镜系统的方法和装置
- Patent Title: Method and apparatus providing singlet wafer lens system with field flattener
- Patent Title (中): 提供具有场平压器的单晶圆片透镜系统的方法和装置
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Application No.: US12167161Application Date: 2008-07-02
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Publication No.: US07920339B2Publication Date: 2011-04-05
- Inventor: Jacques Duparre , Steven D. Oliver
- Applicant: Jacques Duparre , Steven D. Oliver
- Applicant Address: KY George Town
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY George Town
- Main IPC: G02B3/08
- IPC: G02B3/08 ; G02B9/14 ; G02B13/18 ; G11B7/00
Abstract:
Methods and apparatus to correct a curved Petzval focusing surface to a plane using a convex lens, a concave lens, and a space arranged between the curved side of the convex lens and the curved side of the concave lens. The method and apparatus may also include a Fresnel lens arranged between the concave lens and a pixel array.
Public/Granted literature
- US20100002313A1 METHOD AND APPARATUS PROVIDING SINGLET WAFER LENS SYSTEM WITH FIELD FLATTENER Public/Granted day:2010-01-07
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