Invention Grant
- Patent Title: Resistance change nonvolatile memory device
- Patent Title (中): 电阻变化非易失性存储器件
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Application No.: US12513914Application Date: 2008-06-20
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Publication No.: US07920408B2Publication Date: 2011-04-05
- Inventor: Ryotaro Azuma , Kazuhiko Shimakawa , Satoru Fujii , Yoshihiko Kanzawa
- Applicant: Ryotaro Azuma , Kazuhiko Shimakawa , Satoru Fujii , Yoshihiko Kanzawa
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-164545 20070622
- International Application: PCT/JP2008/001603 WO 20080620
- International Announcement: WO2009/001534 WO 20081231
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
Memory cells (MC) are formed at intersections of bit lines (BL) extending in the X direction and word lines (WL) extending in the Y direction. A plurality of basic array planes sharing the word lines (WL), each formed for a group of bit lines (BL) aligned in the Z direction, are arranged side by side in the Y direction. In each basic array plane, bit lines in even layers and bit lines in odd layers are individually connected in common. Each of selection switch elements (101 to 104) controls switching of electrical connection/non-connection between the common-connected even layer bit line and a global bit line (GBL), and each of selection switch elements (111 to 114) control switching of connection/non-connection between the common-connected odd layer bit line and the global bit line (GBL).
Public/Granted literature
- US20100046273A1 RESISTANCE CHANGE NONVOLATILE MEMORY DEVICE Public/Granted day:2010-02-25
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