Invention Grant
- Patent Title: Optical semiconductor device and method of manufacturing same
- Patent Title (中): 光半导体装置及其制造方法
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Application No.: US12245780Application Date: 2008-10-06
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Publication No.: US07920613B2Publication Date: 2011-04-05
- Inventor: Yasutaka Sakata
- Applicant: Yasutaka Sakata
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronic Corporation
- Current Assignee: Renesas Electronic Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2007-262253 20071005
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
The reliability of a buried hetero-structure semiconductor laser is improved by preventing an increase in oscillation threshold current and a decrease in external differential quantum efficiency in cases where the semiconductor laser is energized continuously under conditions of high temperature and high optical output. An optical semiconductor laser has an optical waveguide structure comprising an n-type cladding layer, an active layer and p-type cladding layers, and a current narrowing/blocking structure comprising a p-type blocking layer and an n-type blocking layer, wherein concentration of hydrogen contained in the p-type cladding layers is higher than concentration of hydrogen contained in the p-type blocking layer.
Public/Granted literature
- US20090092164A1 OPTICAL SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Public/Granted day:2009-04-09
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