Invention Grant
US07921802B2 System and method for suppression of wafer temperature drift in cold-wall CVD systems
有权
用于抑制冷壁CVD系统中晶片温度漂移的系统和方法
- Patent Title: System and method for suppression of wafer temperature drift in cold-wall CVD systems
- Patent Title (中): 用于抑制冷壁CVD系统中晶片温度漂移的系统和方法
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Application No.: US10537363Application Date: 2003-11-26
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Publication No.: US07921802B2Publication Date: 2011-04-12
- Inventor: Wiebe De Boer
- Applicant: Wiebe De Boer
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- International Application: PCT/IB03/05447 WO 20031126
- International Announcement: WO2004/053946 WO 20040624
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/44 ; C23C16/46 ; C23C16/458 ; C23C16/52 ; H01L21/3065

Abstract:
An apparatus and corresponding method are disclosed that uses one or more optical fibers in a susceptor that monitor radiation emitted by the backside of the susceptor. The optical fibers are filtered and converted into an electrical signal. A control system is used to maintain a constant wafer temperature by keeping the electrical signal constant during the deposition cycle. This overcomes problems caused by varying wafer temperature during non-selective epitaxial and poly-silicon growth on patterned wafers at low temperatures and reduced pressure.
Public/Granted literature
- US20060057826A1 System and method for suppression of wafer temperature drift in cold-wall cvd systems Public/Granted day:2006-03-16
Information query
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