Invention Grant
US07921802B2 System and method for suppression of wafer temperature drift in cold-wall CVD systems 有权
用于抑制冷壁CVD系统中晶片温度漂移的系统和方法

  • Patent Title: System and method for suppression of wafer temperature drift in cold-wall CVD systems
  • Patent Title (中): 用于抑制冷壁CVD系统中晶片温度漂移的系统和方法
  • Application No.: US10537363
    Application Date: 2003-11-26
  • Publication No.: US07921802B2
    Publication Date: 2011-04-12
  • Inventor: Wiebe De Boer
  • Applicant: Wiebe De Boer
  • Applicant Address: NL Eindhoven
  • Assignee: NXP B.V.
  • Current Assignee: NXP B.V.
  • Current Assignee Address: NL Eindhoven
  • International Application: PCT/IB03/05447 WO 20031126
  • International Announcement: WO2004/053946 WO 20040624
  • Main IPC: C23C16/00
  • IPC: C23C16/00 C23C16/44 C23C16/46 C23C16/458 C23C16/52 H01L21/3065
System and method for suppression of wafer temperature drift in cold-wall CVD systems
Abstract:
An apparatus and corresponding method are disclosed that uses one or more optical fibers in a susceptor that monitor radiation emitted by the backside of the susceptor. The optical fibers are filtered and converted into an electrical signal. A control system is used to maintain a constant wafer temperature by keeping the electrical signal constant during the deposition cycle. This overcomes problems caused by varying wafer temperature during non-selective epitaxial and poly-silicon growth on patterned wafers at low temperatures and reduced pressure.
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