Invention Grant
- Patent Title: Plasma generating nozzle having impedance control mechanism
- Patent Title (中): 等离子体产生喷嘴具有阻抗控制机构
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Application No.: US12315913Application Date: 2008-12-08
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Publication No.: US07921804B2Publication Date: 2011-04-12
- Inventor: Sang Hun Lee
- Applicant: Sang Hun Lee
- Applicant Address: US CA Santa Clara JP Wakayama
- Assignee: Amarante Technologies, Inc.,Saian Corporation
- Current Assignee: Amarante Technologies, Inc.,Saian Corporation
- Current Assignee Address: US CA Santa Clara JP Wakayama
- Agency: Jordan and Hamburg LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; B23K9/02

Abstract:
The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and an impedance controlling structure which adjusts the impedance of the nozzle.
Public/Granted literature
- US20100140509A1 Plasma generating nozzle having impedance control mechanism Public/Granted day:2010-06-10
Information query
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