Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US11155941Application Date: 2005-02-17
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Publication No.: US07922474B2Publication Date: 2011-04-12
- Inventor: Yvonne Wendela Kruijt-Stegeman , Henricus Wilhelmus Aloysius Janssen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- Applicant: Yvonne Wendela Kruijt-Stegeman , Henricus Wilhelmus Aloysius Janssen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/00
- IPC: B29C59/00 ; B29C59/02
Abstract:
An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.
Public/Granted literature
- US20060180952A1 Imprint lithography Public/Granted day:2006-08-17
Information query
