Invention Grant
US07922821B2 Source, an arrangement for installing a source, and a method for installing and removing a source
有权
源，用于安装源的安排，以及用于安装和移除源的方法
- Patent Title: Source, an arrangement for installing a source, and a method for installing and removing a source
- Patent Title (中): 源，用于安装源的安排，以及用于安装和移除源的方法
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Application No.: US11918125Application Date: 2006-04-21
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Publication No.: US07922821B2Publication Date: 2011-04-12
- Inventor: Pekka Soininen
- Applicant: Pekka Soininen
- Applicant Address: FI Vantaa
- Assignee: Beneq Oy
- Current Assignee: Beneq Oy
- Current Assignee Address: FI Vantaa
- Agency: Oliff & Berridge, PLC
- Priority: FI20055189 20050422
- International Application: PCT/FI2006/050159 WO 20060421
- International Announcement: WO2006/111618 WO 20061026
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
The invention relates to an arrangement for installing a source into a gas deposition reactor. The arrangement comprises at least one source fitting for the source such that the source fitting is connected to a reaction space of the gas deposition reactor, and a source installable at least partly inside the source fitting or a source space connected to the source fitting. According to the invention, the arrangement further comprises reception means in the source fitting for receiving the source, and charging means for installing the source in place in the source fitting for use, and a chamber (1), provided in the source, for a solid or liquid source material (3), and isolating means (7, 19) for isolating the chamber (1) substantially from environment.
Public/Granted literature
- US20090277390A1 Source, an Arrangement for Installing a Source, and a Method for Installing and Removing a Source Public/Granted day:2009-11-12
Information query
IPC分类:
