Invention Grant
- Patent Title: Substrate with film and glass for formation film
- Patent Title (中): 基材与膜和玻璃形成膜
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Application No.: US12035204Application Date: 2008-02-21
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Publication No.: US07923115B2Publication Date: 2011-04-12
- Inventor: Kensuke Nagai , Kei Maeda
- Applicant: Kensuke Nagai , Kei Maeda
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-244332 20050825; JP2005-263774 20050912
- Main IPC: B32B17/06
- IPC: B32B17/06 ; B32B9/00 ; B32B9/04

Abstract:
A substrate with film and a glass for forming such a film are provided, wherein the film has high gas barrier property, high transmittance in visible light region, and high productivity since the film provides effective gas barrier property even if the film is a single layer.A substrate with film having an inorganic amorphous film having a softening temperature of from 100 to 800° C. formed on at least one surface of a substrate; or a substrate with film having an inorganic amorphous film having a glass transition temperature of from 50 to 500° C. formed on at least one surface of a substrate. Further, a glass for forming film composed of a borate glass containing B2O3 as the main component, a phosphate glass containing P2O5, a tellurite type composition containing TeO2 as the main component, a bismuth oxide type composition containing Bi2O3 as the main component or a chalcogenide type composition containing at least one type of element selected from the group consisting of S, Se and Te.
Public/Granted literature
- US20080226900A1 SUBSTRATE WITH FILM AND GLASS FOR FORMATION FILM Public/Granted day:2008-09-18
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