Invention Grant
- Patent Title: Method of manufacturing patterned ferroelectric media
- Patent Title (中): 图案化铁电介质的制造方法
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Application No.: US11384326Application Date: 2006-03-21
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Publication No.: US07923262B2Publication Date: 2011-04-12
- Inventor: Simon Buehlmann , Seung-bum Hong
- Applicant: Simon Buehlmann , Seung-bum Hong
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2005-0023243 20050321
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of manufacturing patterned ferroelectric media, which includes forming an electrode on a substrate; forming features having a predetermined pattern on the electrode, the features including a precursor for forming a ferroelectric material; and reacting a source material with the precursor features to transform the precursor features into ferroelectric features. Also disclosed is a method which includes forming on a substrate an electrode having wells and precursor features formed in the wells of the electrode, the precursor features including a precursor for forming a ferroelectric material; and reacting a source material with the precursor features to transform the precursor features into ferroelectric features. The above first embodiment relates to non-embedded type media, and the above second embodiment relates to embedded type media.
Public/Granted literature
- US20060211154A1 Method of manufacturing patterned ferroelectric media Public/Granted day:2006-09-21
Information query
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