Invention Grant
- Patent Title: Semiconductor cleaning using superacids
- Patent Title (中): 半导体清洁使用超强酸
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Application No.: US11350758Application Date: 2006-02-10
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Publication No.: US07923424B2Publication Date: 2011-04-12
- Inventor: Robert J. Small
- Applicant: Robert J. Small
- Applicant Address: US AZ Tucson
- Assignee: Advanced Process Technologies, LLC
- Current Assignee: Advanced Process Technologies, LLC
- Current Assignee Address: US AZ Tucson
- Agency: Steptoe & Johnson LLP
- Main IPC: C11D7/08
- IPC: C11D7/08 ; B08B3/08
Abstract:
A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.
Public/Granted literature
- US20060183248A1 Semiconductor cleaning using superacids Public/Granted day:2006-08-17
Information query
