Invention Grant
- Patent Title: Electron beam device
- Patent Title (中): 电子束装置
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Application No.: US12324937Application Date: 2008-11-28
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Publication No.: US07923685B2Publication Date: 2011-04-12
- Inventor: Ken Harada , Hiroto Kasai
- Applicant: Ken Harada , Hiroto Kasai
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2008-033948 20080215
- Main IPC: H01J37/04
- IPC: H01J37/04

Abstract:
A multi-biprism electron interferometer is configured so as to arrange a plurality of biprisms in an imaging optical system of a specimen. An upper electron biprism is arranged upstream of the specimen in the traveling direction of the electron beam, and an image of the electron biprism is formed on the specimen (object plane) using an imaging action of a pre-field of the objective lens. A double-biprism interference optical system is constructed of a lower electron biprism disposed downstream of the objective lens up to the first image plane of the specimen.
Public/Granted literature
- US20090206256A1 ELECTRON BEAM DEVICE Public/Granted day:2009-08-20
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