Invention Grant
US07923700B2 Sample inspection apparatus, sample inspection method and sample inspection system
有权
样品检验仪器,样品检验方法和样品检测系统
- Patent Title: Sample inspection apparatus, sample inspection method and sample inspection system
- Patent Title (中): 样品检验仪器,样品检验方法和样品检测系统
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Application No.: US11960267Application Date: 2007-12-19
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Publication No.: US07923700B2Publication Date: 2011-04-12
- Inventor: Hidetoshi Nishiyama
- Applicant: Hidetoshi Nishiyama
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2006-340682 20061219; JP2007-012414 20070123
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it with a primary beam (e.g., an electron beam or other charged-particle beam) via the film. The apparatus has the film, a vacuum chamber, primary beam irradiation column, signal detector, and a controller for controlling the operations of the beam irradiation column and signal detector. The sample is held on a first surface of the film opened to permit access to the film. The vacuum chamber reduces the pressure of the ambient in contact with a second surface of the film. The irradiation column irradiates the sample with the primary beam via the film from the second surface side. The detector detects a secondary signal produced from the sample in response to the irradiation.
Public/Granted literature
- US20100096549A1 Sample Inspection Apparatus, Sample Inspection Method and Sample Inspection System Public/Granted day:2010-04-22
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