Invention Grant
- Patent Title: Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods
- Patent Title (中): 组件包括调节系统和至少一个物体，调节系统，光刻设备和方法
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Application No.: US11389493Application Date: 2006-03-27
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Publication No.: US07924399B2Publication Date: 2011-04-12
- Inventor: Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
- Applicant: Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: A61N5/00
- IPC: A61N5/00 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58 ; G03B27/62
Abstract:
An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
Public/Granted literature
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