Invention Grant
- Patent Title: Lithographic apparatus and device and device manufacturing method
- Patent Title (中): 光刻设备和器件制造方法
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Application No.: US11330401Application Date: 2006-01-12
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Publication No.: US07924403B2Publication Date: 2011-04-12
- Inventor: Paulus Martinus Maria Liebregts , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk
- Applicant: Paulus Martinus Maria Liebregts , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/58 ; G03B27/32

Abstract:
A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
Public/Granted literature
- US20060158628A1 Lithographic apparatus and device and device manufacturing method Public/Granted day:2006-07-20
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