Invention Grant
- Patent Title: Exposure device
- Patent Title (中): 曝光装置
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Application No.: US12135375Application Date: 2008-06-09
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Publication No.: US07924407B2Publication Date: 2011-04-12
- Inventor: Takashi Okuyama
- Applicant: Takashi Okuyama
- Applicant Address: JP Tokyo
- Assignee: ORC Manufacturing Co., Ltd.
- Current Assignee: ORC Manufacturing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Berenato & White, LLC
- Priority: JP2007-171880 20070629
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G02B26/00 ; G02B26/12

Abstract:
The present invention relates to an exposure device for forming circuit patterns onto a surface of an object. The exposure device includes at least one spatial light modulator which includes a plurality of reflection elements being arranged in a matrix fashion, at least one optical source which supplies exposure light to the reflection elements, and a bias voltage controller which applies a first voltage to the reflection elements, thereby setting the reflection elements to a first state and which does not apply a voltage to the reflection elements, thereby setting the reflection elements to a second state. In addition, the exposure light is delivered to the surface of the object in the first state, and the exposure light is not delivered to the surface of the object in the second state.
Public/Granted literature
- US20090001292A1 EXPOSURE DEVICE Public/Granted day:2009-01-01
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