Invention Grant
- Patent Title: Measurement method and apparatus, exposure apparatus
- Patent Title (中): 测量方法和装置，曝光装置
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Application No.: US12499531Application Date: 2009-07-08
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Publication No.: US07924437B2Publication Date: 2011-04-12
- Inventor: Kazuki Yamamoto
- Applicant: Kazuki Yamamoto
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-101874 20060403
- Main IPC: G01B11/02
- IPC: G01B11/02
Abstract:
A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.
Public/Granted literature
- US20090303453A1 MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS Public/Granted day:2009-12-10
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