Invention Grant
- Patent Title: Highly repetitive laser system having a compact design
- Patent Title (中): 高度重复的激光系统具有紧凑的设计
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Application No.: US10578508Application Date: 2004-11-25
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Publication No.: US07924902B2Publication Date: 2011-04-12
- Inventor: Daniel Kopf , Maximilian Josef Lederer
- Applicant: Daniel Kopf , Maximilian Josef Lederer
- Applicant Address: AT Hohenems
- Assignee: High Q Laser Production GmbH
- Current Assignee: High Q Laser Production GmbH
- Current Assignee Address: AT Hohenems
- Agency: Oliff & Berridge, PLC
- International Application: PCT/EP2004/013375 WO 20041125
- International Announcement: WO2005/053118 WO 20050609
- Main IPC: H01S3/081
- IPC: H01S3/081

Abstract:
The invention relates to a highly repetitive laser system operating according to the reproducible amplifier principle. Said system comprises at least one amplified laser medium, a laser resonator provided with at least one resonator mirror and at least one modulator and a pump source, in particular, a laser diode source, which is used to pump the laser medium. The highly repetitive laser system is compact by virtue of the fact that a pulse extensor, having a highly dispersive effect as a result of the structure or material thereof, is integrated into the laser resonator.
Public/Granted literature
- US20070053401A1 Highly repetitive laser system having a compact design Public/Granted day:2007-03-08
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