Invention Grant
- Patent Title: Exposure control method
- Patent Title (中): 曝光控制方法
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Application No.: US12456201Application Date: 2009-06-11
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Publication No.: US07925152B2Publication Date: 2011-04-12
- Inventor: Kuo-Chin Lien , Chun-Hung Shen
- Applicant: Kuo-Chin Lien , Chun-Hung Shen
- Applicant Address: TW Chung-Ho
- Assignee: Vatics, Inc.
- Current Assignee: Vatics, Inc.
- Current Assignee Address: TW Chung-Ho
- Agency: Liu & Liu
- Priority: TW97121631A 20080611
- Main IPC: G03B7/00
- IPC: G03B7/00 ; H04N5/238

Abstract:
An exposure control method adjusts an exposure setting used for capturing an image including a foreground object and a background. The foreground object is extracted from the image by an object detection procedure. If the area of the foreground object is greater than a predetermined area value, the brightness of both the foreground object and the background is analyzed. On the contrary, if the area of the foreground object is not greater than the predetermined area value, only the brightness of the background is analyzed. The exposure setting is adjusted according to the analysis result. Accordingly, greater brightness stability is provided during the capture of the following images.
Public/Granted literature
- US20090310955A1 Exposure control method Public/Granted day:2009-12-17
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