Invention Grant
- Patent Title: Method of patterning a substrate
- Patent Title (中): 图案化基板的方法
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Application No.: US11778732Application Date: 2007-07-17
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Publication No.: US07927454B2Publication Date: 2011-04-19
- Inventor: Khanh T. Huynh , Thomas A. Isberg , Matthew S. Stay , William A. Tolbert , Martin B. Wolk , Joseph W. Woody , Robin E. Wright , Haiyan Zhang
- Applicant: Khanh T. Huynh , Thomas A. Isberg , Matthew S. Stay , William A. Tolbert , Martin B. Wolk , Joseph W. Woody , Robin E. Wright , Haiyan Zhang
- Applicant Address: KR Yongin
- Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: Christie, Parker & Hale, LLP
- Main IPC: B44C1/16
- IPC: B44C1/16 ; B29C65/16 ; B32B37/02 ; B32B37/30 ; B32B37/14 ; B32B37/06 ; B32B37/24 ; B32B38/16 ; B44C1/24

Abstract:
A method of forming a metallic material on a receptor that includes the steps of: placing a donor element proximate a receptor, wherein the donor element includes a donor substrate and a thermal transfer layer, wherein the thermal transfer layer includes a catalytic material, and wherein the thermal transfer layer of the donor element is placed proximate the surface of the receptor; thermally transferring at least a portion of the thermal transfer layer from the donor element to the receptor; and electrolessly depositing a metallic material on the receptor by growth of the metallic material on the catalytic material.
Public/Granted literature
- US20090023587A1 METHOD OF PATTERNING A SUBSTRATE Public/Granted day:2009-01-22
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