Invention Grant
US07927780B2 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
有权
抗蚀剂组合物,形成抗蚀剂图案的方法,新型化合物及其制备方法和酸发生剂
- Patent Title: Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
- Patent Title (中): 抗蚀剂组合物,形成抗蚀剂图案的方法,新型化合物及其制备方法和酸发生剂
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Application No.: US12208109Application Date: 2008-09-10
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Publication No.: US07927780B2Publication Date: 2011-04-19
- Inventor: Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
- Applicant: Akiya Kawaue , Takeshi Iwai , Hideo Hada , Shinichi Hidesaka , Tsuyoshi Kurosawa , Natsuko Maruyama , Kensuke Matsuzawa , Takehiro Seshimo , Hiroaki Shimizu , Tsuyoshi Nakamura
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2007-237054 20070912; JP2007-275655 20071023; JP2008-001423 20080108; JP2008-064131 20080313
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; C07D407/02 ; C07D409/02

Abstract:
A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.
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