Invention Grant
US07927780B2 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator 有权
抗蚀剂组合物,形成抗蚀剂图案的方法,新型化合物及其制备方法和酸发生剂

Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
Abstract:
A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.
Information query
Patent Agency Ranking
0/0