Invention Grant
US07927781B2 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same
失效
感光树脂组合物，其制备方法和含有该组合物的干膜抗蚀剂
- Patent Title: Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same
- Patent Title (中): 感光树脂组合物，其制备方法和含有该组合物的干膜抗蚀剂
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Application No.: US12328037Application Date: 2008-12-04
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Publication No.: US07927781B2Publication Date: 2011-04-19
- Inventor: In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
- Applicant: In-Ho Yoon , Bong-Gi Kim , Chang-Seok Rho , Sang-Ki Kang , Kyung-Rock Byun , Chan-Seok Park
- Applicant Address: KR Incheon
- Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee Address: KR Incheon
- Agency: Kile Park Goekjian Reed & McManus PLLC
- Priority: KR10-2004-0099483 20041130
- Main IPC: G03F7/029
- IPC: G03F7/029 ; G03F7/033
Abstract:
The present invention relates to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator; a preparation method thereof; and a dry film resist comprising the same.
Public/Granted literature
- US20090136872A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME Public/Granted day:2009-05-28
Information query
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