Invention Grant
US07927900B2 Method of manufacturing thin film transistor including forming a bank for ink jet printing
有权
制造薄膜晶体管的方法,包括形成用于喷墨印刷的堤
- Patent Title: Method of manufacturing thin film transistor including forming a bank for ink jet printing
- Patent Title (中): 制造薄膜晶体管的方法,包括形成用于喷墨印刷的堤
-
Application No.: US12078693Application Date: 2008-04-04
-
Publication No.: US07927900B2Publication Date: 2011-04-19
- Inventor: Ick Hwan Ko , In Seo Kee , Young Gu Lee , Hong Shik Shim
- Applicant: Ick Hwan Ko , In Seo Kee , Young Gu Lee , Hong Shik Shim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0033264 20070404
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84

Abstract:
Disclosed is a method of manufacturing a thin film transistor, in which a semiconductor layer and a gate insulating film may be formed through ink jet printing using a single bank, thereby simplifying the manufacturing process and decreasing the manufacturing cost, leading to more economical thin film transistors. The thin film transistor manufactured using the method of example embodiments may be used as a switching element for sensors, memory devices, optical devices, and active matrix flat panel displays.
Public/Granted literature
- US20080246089A1 Method of manufacturing thin film transistor Public/Granted day:2008-10-09
Information query
IPC分类: