Invention Grant
- Patent Title: Non-volatile semiconductor storage device and method of manufacturing the same
- Patent Title (中): 非易失性半导体存储装置及其制造方法
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Application No.: US12908546Application Date: 2010-10-20
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Publication No.: US07927926B2Publication Date: 2011-04-19
- Inventor: Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- Applicant: Ryota Katsumata , Masaru Kito , Hiroyasu Tanaka , Masaru Kidoh , Yoshiaki Fukuzumi , Hideaki Aochi , Yasuyuki Matsuoka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-065882 20080314
- Main IPC: H01L21/82
- IPC: H01L21/82

Abstract:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprises: a first columnar semiconductor layer extending in a vertical direction to a substrate; a charge accumulation layer formed around the first columnar semiconductor layer via a first insulation layer; and a first conductive layer formed around the charge accumulation layer via a second insulation layer. Each of the first conductive layers is formed to expand in a two-dimensional manner, and air gaps are formed between the first conductive layers located there above and there below.
Public/Granted literature
- US20110033995A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-02-10
Information query
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