Invention Grant
- Patent Title: Laser mask and crystallization method using the same
- Patent Title (中): 激光掩模和结晶法使用相同
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Application No.: US12320939Application Date: 2009-02-09
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Publication No.: US07927936B2Publication Date: 2011-04-19
- Inventor: JaeSung You
- Applicant: JaeSung You
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR2003-0099390 20031229
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A crystallization method includes providing a substrate having a silicon thin film; positioning a laser mask having first to fourth blocks on the substrate, each block having a periodic pattern including a plurality of transmitting regions and a blocking region; and crystallizing the silicon thin film by irradiating a laser beam through the laser mask. A polycrystalline silicon film crystallized by this method is substantially free from a shot mark, and has uniform crystalline characteristics.
Public/Granted literature
- US20090156018A1 Laser mask and crystallization method using the same Public/Granted day:2009-06-18
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