Invention Grant
- Patent Title: Cleaning of photolithography masks
- Patent Title (中): 清洁光刻掩模
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Application No.: US11715125Application Date: 2007-03-07
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Publication No.: US07927969B2Publication Date: 2011-04-19
- Inventor: Christophe Martin
- Applicant: Christophe Martin
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics S.A.
- Current Assignee: STMicroelectronics S.A.
- Current Assignee Address: FR Montrouge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Agent Lisa K. Jorgenson; James H. Morris
- Priority: FR0650805 20060308
- Main IPC: H01L21/331
- IPC: H01L21/331 ; H01L21/425 ; H01L21/76
Abstract:
A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.
Public/Granted literature
- US20070209682A1 Cleaning of photolithography masks Public/Granted day:2007-09-13
Information query
IPC分类:
