Invention Grant
US07927978B2 Method of making devices including graphene layers epitaxially grown on single crystal substrates 有权
制造包括在单晶衬底上外延生长的石墨烯层的器件的方法

  • Patent Title: Method of making devices including graphene layers epitaxially grown on single crystal substrates
  • Patent Title (中): 制造包括在单晶衬底上外延生长的石墨烯层的器件的方法
  • Application No.: US12587058
    Application Date: 2009-10-01
  • Publication No.: US07927978B2
    Publication Date: 2011-04-19
  • Inventor: Loren Neil Pfeiffer
  • Applicant: Loren Neil Pfeiffer
  • Applicant Address: US NJ Murray Hill
  • Assignee: Alcatel-Lucent USA Inc.
  • Current Assignee: Alcatel-Lucent USA Inc.
  • Current Assignee Address: US NJ Murray Hill
  • Agent M. J. Urband
  • Main IPC: H01L29/772
  • IPC: H01L29/772
Method of making devices including graphene layers epitaxially grown on single crystal substrates
Abstract:
An electronic device comprises a body including a single crystal region on a major surface of the body. The single crystal region has a hexagonal crystal lattice that is substantially lattice-matched to graphene, and a at least one epitaxial layer of graphene is disposed on the single crystal region. In a currently preferred embodiment, the single crystal region comprises multilayered hexagonal BN. A method of making such an electronic device comprises the steps of: (a) providing a body including a single crystal region on a major surface of the body. The single crystal region has a hexagonal crystal lattice that is substantially lattice-matched to graphene, and (b) epitaxially forming a at least one graphene layer on that region. In a currently preferred embodiment, step (a) further includes the steps of (a1) providing a single crystal substrate of graphite and (a2) epitaxially forming multilayered single crystal hexagonal BN on the substrate. The hexagonal BN layer has a surface region substantially lattice-matched to graphene, and step (b) includes epitaxially forming at least one graphene layer on the surface region of the hexagonal BN layer. Applications to FETs are described.
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