Invention Grant
- Patent Title: Charged particle beam apparatus and sample manufacturing method
- Patent Title (中): 带电粒子束装置和样品制造方法
-
Application No.: US11258035Application Date: 2005-10-26
-
Publication No.: US07928377B2Publication Date: 2011-04-19
- Inventor: Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
- Applicant: Tohru Ishitani , Tsuyoshi Ohnishi , Mitsugu Sato , Koichiro Takeuchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-312703 20041027
- Main IPC: G01N23/04
- IPC: G01N23/04

Abstract:
It is possible to carry out a highly accurate thin film machining by irradiation of an ion beam to a sample and a high-resolution STEM observation of the sample by irradiating an electron beam with a high throughput almost without moving the sample. The FIB irradiation system has an irradiation axis almost orthogonally intersecting an irradiation axis of the STEM observation electron beam irradiation system. The sample is arranged at the intersection point of the irradiation axes. The FIB machining plane of the sample is extracted from the thin film plane of the STEM observation sample. The transmitting/scattered beam detector are arranged at backward of the sample on the electron beam irradiation axis viewed from the electron beam irradiation direction.
Public/Granted literature
- US20060097166A1 Charged particle beam apparatus and sample manufacturing method Public/Granted day:2006-05-11
Information query