Invention Grant
US07928425B2 Semiconductor device including a metal-to-semiconductor superlattice interface layer and related methods 有权
包括金属到半导体超晶格界面层的半导体器件及相关方法

Semiconductor device including a metal-to-semiconductor superlattice interface layer and related methods
Abstract:
A semiconductor device which may include a semiconductor layer, and a superlattice interface layer therebetween. The superlattice interface layer may include a plurality of stacked groups of layers. Each group of layers may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. At least some atoms from opposing base semiconductor portions may be chemically bound together with the chemical bonds traversing the at least one intervening non-semiconductor monolayer.
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