Invention Grant
- Patent Title: Semiconductor light emitting device
- Patent Title (中): 半导体发光器件
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Application No.: US12212176Application Date: 2008-09-17
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Publication No.: US07928453B2Publication Date: 2011-04-19
- Inventor: Tsuyoshi Ohgoh
- Applicant: Tsuyoshi Ohgoh
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-243752 20070920
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
An end face emission type semiconductor light emitting device which include: a substrate; a first conductive type clad layer stacked on the substrate; an active region layer including an active layer stacked on the first conductive type clad layer; a second conductive type clad layer stacked on the active region layer such that a thickness of a portion thereof at least over an emission region of the active region layer in an emission end face adjacent area is thinner than a thickness of the other portion; and a second conductive type regrowth layer stacked on the second conductive type clad layer, which has a higher refractive index than the second conductive type clad layer.
Public/Granted literature
- US20090078947A1 SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2009-03-26
Information query
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