Invention Grant
US07928491B2 Semiconductor memory device having reference transistor and method of manufacturing the same 有权
具有参考晶体管的半导体存储器件及其制造方法

Semiconductor memory device having reference transistor and method of manufacturing the same
Abstract:
A semiconductor memory device has: a substrate; a memory cell transistor of a split-gate type formed on the substrate; and a reference transistor formed on the substrate and used for generating a reference current that is used in sensing data stored in the memory cell transistor. The memory cell transistor has a floating gate and a control gate, while the reference transistor is a MIS (Metal Insulator Semiconductor) transistor having a single gate electrode.
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