Invention Grant
- Patent Title: Polysilicon control etch-back indicator
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Application No.: US12653130Application Date: 2009-12-09
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Publication No.: US07928507B2Publication Date: 2011-04-19
- Inventor: Yu Wang , Tiesheng Li , Sung-Shan Tai , Hong Chang
- Applicant: Yu Wang , Tiesheng Li , Sung-Shan Tai , Hong Chang
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Bo-In Lin
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06

Abstract:
This invention discloses a semiconductor wafer for manufacturing electronic circuit thereon. The semiconductor substrate further includes an etch-back indicator that includes trenches of different sizes having polysilicon filled in the trenches and then completely removed from some of the trenches of greater planar trench dimensions and the polysilicon still remaining in a bottom portion in some of the trenches having smaller planar trench dimensions.
Public/Granted literature
- US20100084707A1 Polysilicon control etch-back indicator Public/Granted day:2010-04-08
Information query
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