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US07928533B2 Nano-multiplication region avalanche photodiodes and arrays 有权
纳米倍增区雪崩光电二极管和阵列

Nano-multiplication region avalanche photodiodes and arrays
Abstract:
An avalanche photodiode with a nano-scale reach-through structure comprising n-doped and p-doped regions, formed on a silicon island on an insulator, so that the avalanche photodiode may be electrically isolated from other circuitry on other silicon islands on the same silicon chip as the avalanche photodiode. For some embodiments, multiplied holes generated by an avalanche reduces the electric field in the depletion region of the n-doped and p-doped regions to bring about self-quenching of the avalanche photodiode. Other embodiments are described and claimed.
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