Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11892518Application Date: 2007-08-23
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Publication No.: US07928546B2Publication Date: 2011-04-19
- Inventor: Morifumi Ohno , Motoki Kobayashi , Makoto Terui , Shinji Ohuchi , Mitsuhiko Ogihara
- Applicant: Morifumi Ohno , Motoki Kobayashi , Makoto Terui , Shinji Ohuchi , Mitsuhiko Ogihara
- Applicant Address: JP Tokyo
- Assignee: Oki Electric Industry Co., Ltd.
- Current Assignee: Oki Electric Industry Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Rabin & Berdo, PC
- Priority: JP2006-236699 20060831
- Main IPC: H01L23/02
- IPC: H01L23/02

Abstract:
With the objective of enabling a reduction in the size of a final semiconductor device and its thinning, and attaining facilitation of a manufacturing process, the semiconductor device includes a circuit chip having a flat mounted surface, a circuit chip smaller in size than the former circuit chip, and a sheet-like support. The latter circuit chip is formed over a substrate and has a flat back surface fixed to the substrate and a flat surface positioned on the side opposite to the back surface. The support is bonded to the surface of the latter circuit chip and supports the latter circuit chip. Then, the back surface of the latter circuit chip supported by the support is peeled from the substrate and pressed against the mounted surface, thereby fixing the back surface of the latter circuit chip and the mounted surface by an intermolecular bonding force (e.g., hydrogen bonding).
Public/Granted literature
- US20080054426A1 Semiconductor device and manufacturing method thereof Public/Granted day:2008-03-06
Information query
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