Invention Grant
- Patent Title: Environmental system including a transport region for an immersion lithography apparatus
- Patent Title (中): 环境系统包括浸没式光刻设备的传送区域
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Application No.: US11819446Application Date: 2007-06-27
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Publication No.: US07929110B2Publication Date: 2011-04-19
- Inventor: W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- Applicant: W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
Public/Granted literature
- US20070252961A1 Environmental system including a transport region for an immersion lithography apparatus Public/Granted day:2007-11-01
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