Invention Grant
- Patent Title: Polarized radiation in lithographic apparatus and device manufacturing method
- Patent Title (中): 光刻设备中的极化辐射和器件制造方法
-
Application No.: US12010819Application Date: 2008-01-30
-
Publication No.: US07929116B2Publication Date: 2011-04-19
- Inventor: Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
- Applicant: Christian Wagner , Wilhelmus Petrus De Boeij , Tilmann Heil , Damian Fiolka , Roel De Jonge
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54
Abstract:
A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
Public/Granted literature
- US20080143992A1 Polarized radiation in lithographic apparatus and device manufacturing method Public/Granted day:2008-06-19
Information query
