Invention Grant
US07930113B1 Measuring stresses in multi-layer thin film systems with variable film thickness
有权
在具有可变膜厚度的多层薄膜系统中测量应力
- Patent Title: Measuring stresses in multi-layer thin film systems with variable film thickness
- Patent Title (中): 在具有可变膜厚度的多层薄膜系统中测量应力
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Application No.: US12105238Application Date: 2008-04-17
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Publication No.: US07930113B1Publication Date: 2011-04-19
- Inventor: Yonggang Huang , Ares J. Rosakis
- Applicant: Yonggang Huang , Ares J. Rosakis
- Applicant Address: US CA Pasadena
- Assignee: California Institute of Technology
- Current Assignee: California Institute of Technology
- Current Assignee Address: US CA Pasadena
- Agency: Perkins Coie LLP
- Main IPC: G01L1/00
- IPC: G01L1/00

Abstract:
Systems are described that include computer program products that enable data processing apparatus to perform operations to determine stresses for a system including a substrate with a plurality of films layered thereon. The operations include determining film stresses and system curvatures in terms of misfit strains and thicknesses the plurality of films, determining film stresses and interface shear stresses in terms of system curvature and the thicknesses of each film, and transmitting the film stresses and the interface shear stresses to a computer-readable medium.
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