Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US12232710Application Date: 2008-09-23
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Publication No.: US07931844B2Publication Date: 2011-04-26
- Inventor: Joeri Lof
- Applicant: Joeri Lof
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/00
- IPC: B29C59/00 ; B28B11/00

Abstract:
An imprint lithography apparatus is disclosed which has a needle, and a substrate table arranged to hold a substrate to be imprinted, wherein the needle is moveable between a first position and a second position, the first position being such that in use the needle penetrates a layer of imprintable material on the substrate, and the second position being such that in use the needle is disengaged from the imprintable material on the substrate, the substrate table and the needle arranged such that one may be scanned relative to the other.
Public/Granted literature
- US20090039554A1 Imprint lithography Public/Granted day:2009-02-12
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