Invention Grant
- Patent Title: Stereolithographic method and apparatus
- Patent Title (中): 立体光刻法和仪器
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Application No.: US10570232Application Date: 2004-09-10
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Publication No.: US07931851B2Publication Date: 2011-04-26
- Inventor: Takakuni Ueno
- Applicant: Takakuni Ueno
- Applicant Address: JP Tokyo
- Assignee: Nabtesco Corporation
- Current Assignee: Nabtesco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: JPP2003-319572 20030911
- International Application: PCT/JP2004/013565 WO 20040910
- International Announcement: WO2005/025838 WO 20050324
- Main IPC: B29C35/04
- IPC: B29C35/04

Abstract:
A method and an apparatus includes using a planar plotting mask which can continuously change a mask image; continuously moving the planar plotting mask with reference to the surface of the photocurable resin composition and exposing the surface of a photocurable resin composition to light by way of the planar plotting mask while continuously changing a mask image of the planar plotting mask in accordance with a cross-sectional profile pattern of an optically-cured resin layer to be formed and in synchronism with movement of the planar plotting mask, to thus form an optically-cured resin layer having a predetermined cross-sectional profile pattern; and performing building operation such that boundary areas among adjacent plotted areas in the optically-cured resin layer become unnoticeable in a finally-obtained stereolithographic three-dimensional object.
Public/Granted literature
- US20070029706A1 Optical 3-dimensional object formation and device Public/Granted day:2007-02-08
Information query
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