Invention Grant
- Patent Title: Vertical side wall active pin structures in a phase change memory and manufacturing methods
- Patent Title (中): 垂直侧壁有源引脚结构的相变存储器及制造方法
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Application No.: US12256327Application Date: 2008-10-22
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Publication No.: US07932129B2Publication Date: 2011-04-26
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L21/06
- IPC: H01L21/06

Abstract:
A programmable resistor memory, such as a phase change memory, with a memory element comprising narrow vertical side wall active pins is described. The side wall active pins comprise a programmable resistive material, such as a phase change material. In a first aspect of the invention, a method of forming a memory cell is described which comprises forming a stack comprising a first electrode having a principal surface with a perimeter, an insulating layer overlying a portion of the principal surface of the first electrode, and a second electrode vertically separated from the first electrode and overlying the insulating layer. Side walls on the insulating layer and on the second electrode are positioned over the principle surface of the first electrode with a lateral offset from the perimeter of the first electrode.
Public/Granted literature
- US20090042335A1 VERTICAL SIDE WALL ACTIVE PIN STRUCTURES IN A PHASE CHANGE MEMORY AND MANUFACTURING METHODS Public/Granted day:2009-02-12
Information query
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