Invention Grant
- Patent Title: Field-effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US12199446Application Date: 2008-08-27
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Publication No.: US07932177B2Publication Date: 2011-04-26
- Inventor: Tomoaki Onoue , Takeshi Yasuda , Tetsuo Tsutsui
- Applicant: Tomoaki Onoue , Takeshi Yasuda , Tetsuo Tsutsui
- Applicant Address: JP Kyoto
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2006-050245 20060227
- Main IPC: H01L21/4763
- IPC: H01L21/4763

Abstract:
A field-effect transistor is provided, which includes an organic thin film and which can realize a low threshold voltage while a stable, high field-effect mobility is ensured at the same time. In a field-effect transistor provided with a gate electrode, a source electrode, a drain electrode, a semiconductor film, a gate insulating film, and a substrate, the gate insulating film is formed from a plurality of insulating layers. Here, a first insulating layer in contact with the semiconductor film is formed from poly-p-xylylene formed into a film by a CVD method. A second insulating layer is formed from, for example, cyanoethylpullulan, and the dielectric constant is specified to be higher than that of the first insulating layer.
Public/Granted literature
- US20090095954A1 FIELD-EFFECT TRANSISTOR Public/Granted day:2009-04-16
Information query
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