Invention Grant
- Patent Title: Solvent for cleaning
- Patent Title (中): 溶剂清洗
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Application No.: US11573839Application Date: 2005-07-07
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Publication No.: US07932221B2Publication Date: 2011-04-26
- Inventor: Akira Katano , Tetsuya Kato , Koji Harada
- Applicant: Akira Katano , Tetsuya Kato , Koji Harada
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2004-241617 20040820; JP2005-132036 20050428
- International Application: PCT/JP2005/012574 WO 20050707
- International Announcement: WO2006/018940 WO 20060223
- Main IPC: C11D7/50
- IPC: C11D7/50
Abstract:
A solvent for cleaning that offers particularly superior results for cleaning pigment-dispersed photosensitive resin compositions used for forming color filters and black matrix patterns. The solvent for cleaning has a hydrogen bonding parameter (δH) among the Hansen solubility parameters that falls within a range from 5 to 10.
Public/Granted literature
- US20080039355A1 Solvent for Cleaning Public/Granted day:2008-02-14
Information query
