Invention Grant
- Patent Title: Meander inductor and substrate structure with the same
- Patent Title (中): 曲折电感和衬底结构相同
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Application No.: US12016213Application Date: 2008-01-18
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Publication No.: US07932802B2Publication Date: 2011-04-26
- Inventor: Chang-Lin Wei , Chang-Sheng Chen , Cheng-Hua Tsai , Kuo-Chiang Chin , Chin-Sun Shyu
- Applicant: Chang-Lin Wei , Chang-Sheng Chen , Cheng-Hua Tsai , Kuo-Chiang Chin , Chin-Sun Shyu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW96134864A 20070919
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F29/02 ; H01F27/28 ; H01F27/29

Abstract:
A meander inductor is disclosed, the inductor is disposed on a substrate or embedded therein. The meander inductor includes a conductive layer composed of a plurality of sinusoidal coils with different amplitudes and in series connection to each other, wherein the sinusoidal coils with different amplitudes are laid out according to a periphery outline. The profile of the meander inductor is designed according to an outer frame range available for accommodating the meander inductor and is formed by coils with different amplitudes. Therefore, under a same area condition, the present invention enables the Q factor and the resonant frequency fr of the novel inductor to be advanced, and further expands the applicable range of the inductor.
Public/Granted literature
- US20090072942A1 MEANDER INDUCTOR AND SUBSTRATE STRUCTURE WITH THE SAME Public/Granted day:2009-03-19
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