Invention Grant
- Patent Title: Exposure apparatus having the same ID bias
- Patent Title (中): 曝光装置具有相同的ID偏压
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Application No.: US11952448Application Date: 2007-12-07
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Publication No.: US07932998B2Publication Date: 2011-04-26
- Inventor: Hyun Jo Yang
- Applicant: Hyun Jo Yang
- Applicant Address: KR Icheon-si
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Icheon-si
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2007-0063923 20070627
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54
Abstract:
An exposure apparatus includes an exposure light source generating light to be emitted to photomask, a projection lens for projecting the light having passed through the photomask to wafer, and a transmittance adjustment filter in projection lens the transmittance adjustment filter varies the transmittance of the light projected into the projection lens as a function of position in the projection lens.
Public/Granted literature
- US20090002672A1 EXPOSURE APPARATUS HAVING THE SAME ID BIAS Public/Granted day:2009-01-01
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