Invention Grant
- Patent Title: Method and apparatus for verifying proper substrate positioning
- Patent Title (中): 用于验证适当的基板定位的方法和装置
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Application No.: US11829748Application Date: 2007-07-27
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Publication No.: US07933009B2Publication Date: 2011-04-26
- Inventor: Oleg Serebryanov , Alexander Lerner , Aaron Hunter , Joseph M. Ranish
- Applicant: Oleg Serebryanov , Alexander Lerner , Aaron Hunter , Joseph M. Ranish
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser IP Law Group
- Main IPC: G01J1/00
- IPC: G01J1/00 ; G01B11/14

Abstract:
Embodiments of methods and apparatus for detecting the proper position of a substrate in a chamber are provided herein. In some embodiments, a substrate position detection apparatus includes a substrate support having a plurality of lift pins for supporting a substrate in an elevated position thereover; a light source for directing a beam of light upon a reflective upper surface of the substrate; and a light sensor for detecting a reflected beam of light from the upper surface of the substrate upon the substrate being aligned in a predetermined elevated position.
Public/Granted literature
- US20090027657A1 METHOD AND APPARATUS FOR VERIFYING PROPER SUBSTRATE POSITIONING Public/Granted day:2009-01-29
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