Invention Grant
- Patent Title: Focus optical system and optical disc master exposure apparatus
- Patent Title (中): 聚焦光学系统和光盘主曝光设备
-
Application No.: US12423911Application Date: 2009-04-15
-
Publication No.: US07933189B2Publication Date: 2011-04-26
- Inventor: Takeshi Omori , Takaaki Kassai , Kenji Maebara , Keiji Fujita , Hiroaki Ashiwa
- Applicant: Takeshi Omori , Takaaki Kassai , Kenji Maebara , Keiji Fujita , Hiroaki Ashiwa
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2008-108821 20080418
- Main IPC: G11B7/00
- IPC: G11B7/00

Abstract:
In a focus optical system for optical discs or optical disc master exposure apparatuses, a relative positional relation between a cylindrical lens and a 4-division detector in an astigmatic optical system is adjust so that an interference fringe appearing in reflected light derived from an optical disc master is made to be incident on a dead zone of the 4-division detector. Thus, an astigmatic focus servo free from effects of variations in a focus error signal due to the interference fringe is realized. As a result of this, effects of the interference fringe appearing in the reflected light derived from an optical disc or optical disc master can be suppressed.
Public/Granted literature
- US20090262634A1 FOCUS OPTICAL SYSTEM AND OPTICAL DISC MASTER EXPOSURE APPARATUS Public/Granted day:2009-10-22
Information query
IPC分类: